Verhelle, TippiTippiVerhelleHenderick, LowieLowieHenderickYari, SaeedSaeedYariCoessens, SiebeSiebeCoessensMinjauw, Matthias M.Matthias M.MinjauwDe Taeye, LouisLouisDe TaeyeVereecken, PhilippePhilippeVereeckenDendooven, JolienJolienDendoovenSafari, MomoMomoSafariDetavernier, ChristopheChristopheDetavernier2026-07-272026-07-2720262050-74882050-7496https://imec-publications.be/handle/20.500.12860/59999<jats:p> Plasma pretreatments create well-defined and reproducible lithium surfaces that govern TMA reactivity, leading to precursor decomposition or ALD-like Al <jats:sub>2</jats:sub> O <jats:sub>3</jats:sub> growth. </jats:p>eng<i>In vacuo</i> XPS study: controlled ALD growth of Al<sub>2</sub>O<sub>3</sub> on metallic lithium enabled by plasma pretreatmentJournal article10.1039/d6ta00751aWOS:001748956700001ATOMIC LAYER DEPOSITIONANODESPERFORMANCEFILMSLI2050-7496