Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

Foubert, PhilippePhilippeFoubertMatsunaga, KoichiKoichiMatsunagaShite, HideoHideoShiteShimoaoki, TakeshiTakeshiShimoaokiNafus, KathleenKathleenNafusGoethals, MiekeMiekeGoethalsVan Den Heuvel, DieterDieterVan Den HeuvelHermans, JanJanHermansHendrickx, EricEricHendrickxKosugi, HitoshiHitoshiKosugi2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22356Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline processProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675314