Influence of boron implantation dose on the mechanical stress in polycrystalline silicon films

Nakabayashi, M.M.NakabayashiIkegami, M.M.IkegamiOhyama, HidenoriHidenoriOhyamaKobauashi, K.K.KobauashiYoneoka, M.M.YoneokaSimoen, EddyEddySimoenClaeys, CorCorClaeysTakami, Y.Y.TakamiSunaga, H.H.SunagaTakizawa, H.H.Takizawa2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4605Influence of boron implantation dose on the mechanical stress in polycrystalline silicon filmsProceedings paper