Orzali, TommasoTommasoOrzaliWang, G.G.WangWaldron, NiamhNiamhWaldronMerckling, ClementClementMercklingRichard, OlivierOlivierRichardBender, HugoHugoBenderCaymax, MattyMattyCaymax2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19522In-Situ HCl etching of InP in shallow-trench-isolated structuresMeeting abstract