Totir, GeorgeGeorgeTotirFrank, Martin M.Martin M.FrankVos, RitaRitaVosArnauts, SophiaSophiaArnautsBearda, TwanTwanBeardaKenis, KarineKarineKenisDelande, TinneTinneDelandeLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersVereecke, GuyGuyVereeckeMannaert, GeertGeertMannaertLux, MarcelMarcelLuxHoflijk, IlseIlseHoflijkConard, ThierryThierryConardBanerjee,BanerjeeMalhouitre, StephaneStephaneMalhouitreLeunissen, PeterPeterLeunissenMertens, PaulPaulMertens2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12985Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatmentsProceedings paper