Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

Tomida, KazuyukiKazuyukiTomidaPopovici, Mihaela IoanaMihaela IoanaPopoviciOpsomer, KarlKarlOpsomerMenou, NicolasNicolasMenouDelabie, AnneliesAnneliesDelabieSwerts, JohanJohanSwertsSteenbergen, JohnnyJohnnySteenbergenKaczer, BenBenKaczerVan Elshocht, SvenSvenVan ElshochtDetavernier, ChristopheChristopheDetavernierWouters, DirkDirkWoutersKittl, JorgeJorgeKittl2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16316Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealingOral presentation