Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly

Verstraete, LanderLanderVerstraeteVallat, RemiRemiVallatVan Bel, JulieJulieVan BelJob, Min-GiMin-GiJobBezard, PhilippePhilippeBezardSuh, Hyo SeonHyo SeonSuh2025-07-312025-07-312025978-1-5106-8640-30277-786XWOS:001517361100012https://imec-publications.be/handle/20.500.12860/45980Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assemblyProceedings paper10.1117/12.3051663978-1-5106-8641-0WOS:001517361100012