Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

Drissi, YoussefYoussefDrissiGillijns, WernerWernerGillijnsLardenois, SebastienSebastienLardenoisVerheyen, PeterPeterVerheyenLepage, GuyGuyLepageMohsen, MahmoudMahmoudMohsenDelorme, MaxenceMaxenceDelorme2023-06-052022-08-112023-06-052022978-1-5106-4895-10277-786XWOS:000831704500007https://imec-publications.be/handle/20.500.12860/40241Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniquesProceedings paper10.1117/12.2609092978-1-5106-4896-8WOS:000831704500007