Conard, ThierryThierryConardDe Witte, HildeHildeDe WitteSchaekers, MarcMarcSchaekersVandervorst, WilfriedWilfriedVandervorst2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4216Quantitative TOFSIMS depth profiling of ultra thin silicon oxynitride filmsProceedings paper