Mitigation of plasma-induced damage of advanced 2.0 porous dielectrics by the pore stuffing approach

Heyne, MarkusMarkusHeyneZhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeGronheid, RoelRoelGronheidWilson, ChrisChrisWilsonBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22487Mitigation of plasma-induced damage of advanced 2.0 porous dielectrics by the pore stuffing approachMeeting abstracthttp://www2.avs.org/symposium/avs60/pdfs/abstractbook.pdf