Bright-field EUV mask patterning for extending scaling roadmap

Miyaguchi, KenichiKenichiMiyaguchiFujimura, YukihiroYukihiroFujimuraYamaji, MasatakaMasatakaYamajiEbisawa, MeiMeiEbisawaHotei, IzumiIzumiHoteiAbe, TsukasaTsukasaAbeTomizuka, ShosukeShosukeTomizukaDeguchi, HirokiHirokiDeguchiYoshikawa, ShingoShingoYoshikawaTan, Ling EeLing EeTanTrivkovic, DarkoDarkoTrivkovicSherazi, YasserYasserSheraziKim, Ryan Ryoung HanRyan Ryoung HanKim2026-03-312026-03-312025978-1-5106-9320-30277-786Xhttps://imec-publications.be/handle/20.500.12860/58973engBright-field EUV mask patterning for extending scaling roadmapProceedings paper10.1117/12.3075933WOS:001674167600026