Baklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschStorm, WolfgangWolfgangStormVandervorst, WilfriedWilfriedVandervorstMaex, KarenKarenMaex2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2365Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasmaJournal article