Reliability Investigations of Advanced Photosensitive Polymer based RDL Processes Protected by Inorganic Capping Layers

Chery, EmmanuelEmmanuelCheryBhatia, RitwikRitwikBhatiaSundaram, GaneshGaneshSundaramPinho, NelsonNelsonPinhoBeyne, EricEricBeyne2025-04-102024-12-072025-04-102024979-8-3503-7599-20569-5503WOS:001260983500104https://imec-publications.be/handle/20.500.12860/44932Reliability Investigations of Advanced Photosensitive Polymer based RDL Processes Protected by Inorganic Capping LayersProceedings paper10.1109/ECTC51529.2024.00109979-8-3503-7598-5WOS:001260983500104COPPERAL2O3DEPOSITIONBARRIERMETAL