Intrinsic study of current crowding and current density gradient effects on electromigration in BEOL copper interconnects

Croes, KristofKristofCroesLi, YunlongYunlongLiLofrano, MelinaMelinaLofranoWilson, ChrisChrisWilsonTokei, ZsoltZsoltTokei2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22187Intrinsic study of current crowding and current density gradient effects on electromigration in BEOL copper interconnectsProceedings paper