The black silicon method. VIII. A study of the performance of etching silicon using Sf6/O-2-based chemistry with cryogenical wafer cooling and a high density ICP Source

Jansen, HenriHenriJansenDe Boer, M.M.De BoerWensink, H.H.WensinkKloeck, B.B.KloeckElwenspoek, M.M.Elwenspoek2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5367The black silicon method. VIII. A study of the performance of etching silicon using Sf6/O-2-based chemistry with cryogenical wafer cooling and a high density ICP SourceJournal article