Scaling perspective and reliability of conductive filament formation in ultra-scaled HfO2 resistive random access memory

Puglisi, F.M.F.M.PuglisiCelano, UmbertoUmbertoCelanoPadovani, A.A.PadovaniVandervorst, WilfriedWilfriedVandervorstLarcher, LucaLucaLarcherPavan, P.P.Pavan2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29226Scaling perspective and reliability of conductive filament formation in ultra-scaled HfO2 resistive random access memoryProceedings paper