Yamamoto, HirokiHirokiYamamotoVesters, YannickYannickVestersJiang, JingJingJiangDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenbergheKozawa, TakahiroTakahiroKozawa2021-10-272021-10-272019-010914-9244https://imec-publications.be/handle/20.500.12860/34477Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resistJournal articlehttps://doi.org/10.2494/photopolymer.31.747