Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions

Shamiryan, DenisDenisShamiryanWeidner, K.K.WeidnerGray, W.D.W.D.GrayBaklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6821Comparative study of PECVD SiOCH low-k films obtained at different deposition conditionsJournal article