Veloso, AnabelaAnabelaVelosoRagnarsson, Lars-AkeLars-AkeRagnarssonSchram, TomTomSchramChew, Soon AikSoon AikChewBoccardi, GuillaumeGuillaumeBoccardiThean, AaronAaronTheanHoriguchi, NaotoNaotoHoriguchi2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23318Integration challenges and options of replacement high-k/metal gate technology for (Sub-)22nm technology nodesProceedings paper