FEOL etch challenges, from planar metal gates towards FinFET devices

Altamirano Sanchez, EfrainEfrainAltamirano SanchezParaschiv, VasileVasileParaschivBoullart, WernerWernerBoullart2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20282FEOL etch challenges, from planar metal gates towards FinFET devicesMeeting abstract