Depas, MichelMichelDepasNigam, TanyaTanyaNigamKenis, KarineKarineKenisHeyns, MarcMarcHeynsSprey, HesselHesselSpreyWilhelm, RudiRudiWilhelm2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1205Ultra-thin gate oxides below 3 nm grown in a cluster toolProceedings paper