I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration

Ritzenthaler, RomainRomainRitzenthalerSchram, TomTomSchramCho, Moon JuMoon JuChoMocuta, AndaAndaMocutaHoriguchi, NaotoNaotoHoriguchiThean, AaronAaronTheanSpessot, AlessioAlessioSpessotCaillat, ChristianChristianCaillatAoulaiche, MarcMarcAoulaicheFazan, PierrePierreFazanNoh, Kyung BongKyung BongNohSon, YunikYunikSon2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25824I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integrationProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7165908