Low-temperature chemical vapor deposition of highly-doped n-type epitaxial Si at high growth rate

Nguyen, DuyDuyNguyenLoo, RogerRogerLooCaymax, MattyMattyCaymax2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12612Low-temperature chemical vapor deposition of highly-doped n-type epitaxial Si at high growth rateMeeting abstracthttp://www.comp.metro-u.ac.jp/iscsi-5/