Dussart, R.R.DussartTillocher, T.T.TillocherGosset, N.N.GossetVital, AAVitalLefaucheux, P.P.LefaucheuxL'jazouli, RRL'jazouliBoufnichel, M.M.BoufnichelVayer, M.M.VayerSinturel, C.C.SinturelZhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanovNishimura, E.E.NishimuraYatsuda, K.K.YatsudaMaekawa, K.K.Maekawa2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23783Plasma cryoetching processes for silicon and advanced materialsMeeting abstract