Heyns, MarcMarcHeynsDepas, MichelMichelDepasTeerlinck, IvoIvoTeerlinckMeuris, MarcMarcMeurisMertens, PaulPaulMertensVanhellemont, JanJanVanhellemontMouche, LaurentLaurentMoucheNigam, TanyaTanyaNigamWilhelm, RudiRudiWilhelmKnotter, MartinMartinKnotterWolke, K.K.WolkeCrossley, A.A.CrossleySofield, C. J.C. J.SofieldGräf, D.D.Gräf2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1260Ultra thin gate oxide technology and reliabilityProceedings paper