Tritchkov, AlexanderAlexanderTritchkovFinders, JoJoFindersRandall, JohnJohnRandallRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3002Proximity effects correction for advanced optical lithography processesJournal article