Mask Contribution to OPC Model Accuracy

Lyons, AdamAdamLyonsWallow, TomTomWallowHennerkes, ChristophChristophHennerkesSpence, ChrisChrisSpenceDelorme, MaxMaxDelormeRio, DavidDavidRioTsunoda, DaiDaiTsunodaTorigoe, YoheiYoheiTorigoeHamaji, MasakazuMasakazuHamaji2021-12-102021-11-022021-12-1020200277-786XWOS:000632585900017https://imec-publications.be/handle/20.500.12860/38086Mask Contribution to OPC Model AccuracyProceedings paper10.1117/12.2573160978-1-5106-3843-3WOS:000632585900017