Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)

Chanson, RomainRomainChansonLefaucheux, PhilippePhilippeLefaucheuxDussart, RemiRemiDussartShen, PengPengShenUrabe, KeiichiroKeiichiroUrabeDussarat, ChristianChristianDussaratMaekawa, KaoruKaoruMaekawayatsuda, koichikoichiyatsudaTahara, ShigeruShigeruTaharade Marneffe, Jean-FrancoisJean-Francoisde Marneffe2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28003Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)Meeting abstracthttps://www.uantwerpen.be/images/uantwerpen/container2642/files/events/iPlasmaNano-VIII_Programme-booklet.pdf