Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy films

Whelan, CarolineCarolineWhelanLe, Quoc ToanQuoc ToanLeCecchet, FrancescaFrancescaCecchetSatta, AlessandraAlessandraSattaPireaux, Jean-JacquesJean-JacquesPireauxRudolf, PetraPetraRudolfMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9916Sealing of porous low-k dielectrics: an ellipsometric porosimetry study of UV-O3 oxidized SiOxCy filmsJournal article