Loo, RogerRogerLooHikavyy, AndriyAndriyHikavyyRosseel, ErikErikRosseelPorret, ClémentClémentPorretVohra, AnuragAnuragVohraKohen, DavidDavidKohenMargetis, JoeJoeMargetisTolle, JohnJohnTolleLanger, RobertRobertLanger2021-10-252021-10-252018-05https://imec-publications.be/handle/20.500.12860/31231Epitaxial growth schemes for Fin and Gate-All-Around devicesMeeting abstract