Rathore, AshishAshishRathorePollentier, IvanIvanPollentierCipriani, MaicolMaicolCiprianiSingh, HarpreetHarpreetSinghDe Simone, DaniloDaniloDe SimoneIngolfsson, OddurOddurIngolfssonDe Gendt, StefanStefanDe Gendt2022-03-012022-03-0120212637-6105WOS:000639061000026https://imec-publications.be/handle/20.500.12860/39194Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist SystemsJournal article10.1021/acsapm.1c00018WOS:000639061000026RESIST MATERIALSBILAYER RESISTELECTRONSDESIGN