Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle

Croes, KristofKristofCroesCannata, GianlucaGianlucaCannataZhao, LarryLarryZhaoTokei, ZsoltZsoltTokei2021-10-172021-10-1720080026-2714https://imec-publications.be/handle/20.500.12860/13570Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicleJournal article