Investigation of plasma damage of low-k dielectrics during cryogenic etching

Rezvanov, A.A.RezvanovMiakonkikh, A.A.MiakonkikhVishnevsky, A.A.VishnevskyGutshin, O.O.GutshinGornev, E.E.GornevKrasnikov, G.G.KrasnikovMogilnikov, K.K.MogilnikovRudenko, K.K.RudenkoBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25816Investigation of plasma damage of low-k dielectrics during cryogenic etchingProceedings paper