Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Kim, Young-ChangYoung-ChangKimBeckx, StephanStephanBeckxVanhaelemeersch, SergeSergeVanhaelemeerschVandervorst, WilfriedWilfriedVandervorst2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3557Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaningProceedings paper