Ronse, KurtKurtRonseDe Bisschop, PeterPeterDe BisschopGoethals, MiekeMiekeGoethalsHermans, JanJanHermansJonckheere, RikRikJonckheereLight, ScottScottLightOkoroanyanwu, UzoUzoOkoroanyanwuWatso, RobertRobertWatsoMcAfferty, D.D.McAffertyIvaldi, J.J.IvaldiOneil, T.T.OneilSewell, H.H.Sewell2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9526Status and critical challenges for 157nm lithographyJournal article