High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

Cross, AndrewAndrewCrossSah, KaushikKaushikSahAnantha, VidyasagarVidyasagarAnanthaGupta, BalarkaBalarkaGuptaYnzunza, RamonRamonYnzunzaTroy, NeilNeilTroyWu, KenongKenongWuBabulnath, RaghavRaghavBabulnathRajendran, MeghnaMeghnaRajendranVan den Heuvel, DieterDieterVan den HeuvelLeray, PhilippePhilippeLeray2022-01-272021-11-022022-01-2720200277-786XWOS:000632585900009https://imec-publications.be/handle/20.500.12860/38080High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualificationProceedings paper10.1117/12.2572912978-1-5106-3843-3WOS:000632585900009