Jourdan, NicolasNicolasJourdanBarbarin, YohanYohanBarbarinCroes, KristofKristofCroesSiew, Yong KongYong KongSiewVan Elshocht, SvenSvenVan ElshochtTokei, ZsoltZsoltTokeiVancoille, EricEricVancoille2021-10-212021-10-2120132162-8726https://imec-publications.be/handle/20.500.12860/22558Plasma enhanced chemical vapor deposition of manganese on low-k dielectrics for copper diffusion barrier applicationJournal article