Line width roughness mitigation in chemically amplified resist by post-litho processes

Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheid2021-10-182021-10-1820100167-9317https://imec-publications.be/handle/20.500.12860/18125Line width roughness mitigation in chemically amplified resist by post-litho processesJournal article