Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal

Le, Quoc ToanQuoc ToanLede Marneffe, Jean-FrancoisJean-Francoisde MarneffeConard, ThierryThierryConardLux, MarcelMarcelLuxVereecke, GuyGuyVereecke2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17460Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removalProceedings paper