Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via Integration

Pasquali, MattiaMattiaPasqualiBrady-Boyd, AnitaAnitaBrady-BoydLesniewska, AlicjaAlicjaLesniewskaCarolan, PatrickPatrickCarolanConard, ThierryThierryConardO'Connor, RobertRobertO'ConnorDe Gendt, StefanStefanDe GendtArmini, SilviaSilviaArmini2023-07-242023-02-192023-07-2420231944-8244WOS:000921980000001https://imec-publications.be/handle/20.500.12860/41113Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via IntegrationJournal article10.1021/acsami.2c18014WOS:000921980000001ATOMIC LAYER DEPOSITIONRAY PHOTOELECTRON-SPECTROSCOPYAL2O3 THIN-FILMSDIMETHYLALUMINUM ISOPROPOXIDEREACTION-MECHANISMALUMINUMGROWTHSIO2NUCLEATIONCHEMISTRYMEDLINE:36649199