Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions

Lorusso, GianGianLorussoRispens, GijsbertGijsbertRispensRutigliani, VitoVitoRutiglianiVan Roey, FriedaFriedaVan RoeyFrommhold, AndreasAndreasFrommholdSchiffelers, GuidoGuidoSchiffelers2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33478Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributionsMeeting abstracthttps://doi.org/10.1117/12.2515175