Alternative double patterning processes: ready for (sub) 32nm hp

Wong, PatrickPatrickWongMaenhoudt, MireilleMireilleMaenhoudtVangoidsenhoven, DizianaDizianaVangoidsenhovenWiaux, VincentVincentWiaux2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16558Alternative double patterning processes: ready for (sub) 32nm hpProceedings paper