Franco, JacopoJacopoFrancoKaczer, BenBenKaczerMitard, JeromeJeromeMitardToledano Luque, MariaMariaToledano LuqueRoussel, PhilippePhilippeRousselWitters, LiesbethLiesbethWittersGrasser, TiborTiborGrasserGroeseneken, GuidoGuidoGroeseneken2021-10-212021-10-2120131530-4388https://imec-publications.be/handle/20.500.12860/22358NBTI reliability of SiGe and Ge channel pMOSFETs with SiO2/HfO2 dielectric stackJournal articlehttp://dx.doi.org/10.1109/TDMR.2013.2281731