Hooker, JacobJacobHookerLander, RobRobLanderCubaynes, FlorenceFlorenceCubaynesSchram, TomTomSchramRoozeboom, F.F.Roozeboomvan Zijl, J.J.van ZijlMaas, M.M.Maasvan den Heuvel, F.C.F.C.van den HeuvelNaburgh, E.E.Naburghvan Berkum, J.G.M.J.G.M.van BerkumTamminga, Y.Y.TammingaDao, T.T.DaoHenson, KirklenKirklenHensonSchaekers, MarcMarcSchaekersVan Ammel, AnnemieAnnemieVan AmmelTokei, ZsoltZsoltTokeiDemand, MarcMarcDemandDachs, C.C.Dachs2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10603Tantalum-based gate electrode metals for advanced CMOS devicesProceedings paper