Nanostructured silicon surface morphology formation under highly ionized microwave plasma conditions

Baklanov, MikhaïlMikhaïlBaklanovGuschin, O.O.GuschinIgnatov, P.P.IgnatovYafarov, R.R.YafarovYanovich, S.S.Yanovich2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18521Nanostructured silicon surface morphology formation under highly ionized microwave plasma conditionsOral presentation