Process compatibility of new advanced low-k dielectric

Ferchichi, AbdelkarimAbdelkarimFerchichiVanstreels, KrisKrisVanstreelsHeylen, NancyNancyHeylenBeyer, GeraldGeraldBeyerBaklanov, MikhaïlMikhaïlBaklanovAsakuma, S.S.AsakumaNakajima, M.M.Nakajima2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15302Process compatibility of new advanced low-k dielectricMeeting abstract