Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node

Sakhare, SushilSushilSakhareTrivkovic, DarkoDarkoTrivkovicMountsier, TomTomMountsierKim, Min-SooMin-SooKimMocuta, DanDanMocutaRyckaert, JulienJulienRyckaertMercha, AbdelkarimAbdelkarimMerchaVerkest, DiederikDiederikVerkestThean, AaronAaronTheanDusa, MirceaMirceaDusa2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25852Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology nodeProceedings paperhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2086100