Processing factors influencing the leakage current in shallow junction diodes for deep submicron CMOS

Grau, LluisLluisGrauAugendre, EmmanuelEmmanuelAugendreSimoen, EddyEddySimoenRooyackers, RitaRitaRooyackersClaeys, CorCorClaeysBadenes, GonçalGonçalBadenesRomano-Rodriguez, A.A.Romano-Rodriguez2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4401Processing factors influencing the leakage current in shallow junction diodes for deep submicron CMOSProceedings paper