Vandervorst, WilfriedWilfriedVandervorstJanssens, TomTomJanssensBrijs, BertBertBrijsLindsay, RichardRichardLindsayCollart, E.J.H.E.J.H.CollartKirkwood, D.A.D.A.KirkwoodMathot, G.G.MathotTerwagne, G.G.Terwagne2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6987Profile changes and self-sputtering during low energy ion implantationProceedings paper