Collaert, NadineNadineCollaertDemand, MarcMarcDemandFerain, IsabelleIsabelleFerainLisoni, JuditJuditLisoniSinganamalla, RaghunathRaghunathSinganamallaZimmerman, PaulPaulZimmermanYim, Yong SikYong SikYimSchram, TomTomSchramMannaert, GeertGeertMannaertGoodwin, MichaelMichaelGoodwinHooker, JacobJacobHookerNeuilly, FrancoisFrancoisNeuillyKim, Myeong-CheolMyeong-CheolKimDe Meyer, KristinKristinDe MeyerDe Gendt, StefanStefanDe GendtBoullart, WernerWernerBoullartJurczak, GosiaGosiaJurczakBiesemans, SergeSergeBiesemans2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10246Tall triple-gate device with TiN/HfO2 gate stackProceedings paper